16 October 2012 Evolution and control of optical thin film stress
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Proceedings Volume 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 84160K (2012) https://doi.org/10.1117/12.2009292
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China
Abstract
Fine control of Optical Thin Film Stress is critical to develop an expected profile parameters of large aperture coated optics. In our latest effort, the evolution of stress and force per unit width of multilayer thin film formulas, (H2L)6, (H2L)5H and (HL)7, consisted of HfO2 and SiO2 were researched. The stresses of SiO2 single layers deposited on the HfO2 were small than those grew on glass and get smaller as the multilayer thin film deposited. While the stresses of HfO2 films deposited on the SiO2 were positive correlation with the stress of SiO2.
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Ming Fang, Ming Fang, JingPing Li, JingPing Li, HongBo He, HongBo He, Zhengxiu Fan, Zhengxiu Fan, Qilin Xiao, Qilin Xiao, ZhaoYang Li, ZhaoYang Li, } "Evolution and control of optical thin film stress", Proc. SPIE 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 84160K (16 October 2012); doi: 10.1117/12.2009292; https://doi.org/10.1117/12.2009292
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