16 October 2012 High performance narrow band-pass filter for the NIR/MWIR range
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Proceedings Volume 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 84160M (2012) https://doi.org/10.1117/12.975755
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China
Abstract
High performance narrow band-pass filter(NBF) designed for dual-band infrared(IR) detectors of near-infrared(NIR) and mid-wavelength infrared(MWIR) application is presented. As the part of dual-color filters, the filter features a high transmittance at the center wavelength of 1.55μm and a broadband rejection out of the pass band from 1 to 5μm. The pass band need to be centered in 1.55±0.03μm, have a full width at half maximum of less than 0.055μm and maximum transmittance higher than 75% when measured at normal incidence. Thin-film design for the filters is investigated in detail and two kinds of multilayer schemes are obtained by computer optimization. Both consist of a fundamental narrow-band filter of Fabry-Perot cavity with Si/SiO2 and Ti3O5/SiO2 as the material pair, respectively, and three edge filters with the material pair of Si/SiO2 for wide band rejection. Moreover, the preparation of the filters have been given, including the deposition parameters and especially, the optical thickness monitoring of the stack of Fabry-Perot cavity. Finally, the filters meeting the requirements are accomplished and characterized, which have the peak transmittance of about 82%, a full width at half maximum of 0.050μm and a broadband rejection with the average transmittance lower than 1% from 1 to 5μm.
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Xian Jun Su, Xian Jun Su, Wei Wu, Wei Wu, Kai Yan, Kai Yan, Feng Jin Chen, Feng Jin Chen, Chao Meng, Chao Meng, } "High performance narrow band-pass filter for the NIR/MWIR range", Proc. SPIE 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 84160M (16 October 2012); doi: 10.1117/12.975755; https://doi.org/10.1117/12.975755
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