Paper
16 October 2012 Research on SiO2 film laser damage threshold
Tao Wang, Lihong Yang
Author Affiliations +
Proceedings Volume 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 84162D (2012) https://doi.org/10.1117/12.974305
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China
Abstract
The high energy laser put forward higher requirements about resistance laser damage ability of thin film on surface of optical component, this makes coating film not only consider the optical parameters of thin films, but also consider the film’s laser damage threshold to get the optical system work normally. mainly analyzing factors about effecting the SiO2 thin film’s laser damage threshold and researching respectively the SiO2 thin film’s optical parameters (such as extinction coefficient, thickness, refractive index and so on) and light sources parameters of testing system (such as laser times of irradiation, pulse width and so on) impact on thin film laser damage threshold. Research shows that thin film optical parameters have little influence on laser damage threshold, testing laser parameters have great influence on laser damage threshold.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tao Wang and Lihong Yang "Research on SiO2 film laser damage threshold", Proc. SPIE 8416, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 84162D (16 October 2012); https://doi.org/10.1117/12.974305
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KEYWORDS
Laser damage threshold

Thin films

Refractive index

Silica

Pulsed laser operation

Laser induced damage

Laser energy

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