Study of exposure process of photoresist using phase-modulated ellipsometer

Wende Liu; Chi Chen; Qiming Fan; Xi Chen; Chundi Zheng; Yu Wang

doi:10.1117/12.970644

15 October 2012 Study of exposure process of photoresist using phase-modulated ellipsometer

Wende Liu, Chi Chen, Qiming Fan, Xi Chen, Chundi Zheng, Yu Wang

Proceedings Volume 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 84170I (2012) https://doi.org/10.1117/12.970644
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China

Abstract

The phase modulated ellipsometer (PME) was used to investigate the exposure procedure of S9912 photoresist film, and the optical constants as well as its changing process before/after the exposure and during the exposure process were obtained. The paper solved the measurement and analysis related methods when applying the PME, including choosing suitable optical filter to assist the ellipsometric test; measuring scheme optimization for specific wavelength range; combining dispersive-model-based nonlinear fit and point-by-point extreme value algorithm. The thickness change was also observed before/after the exposure and suitably utilized to analyze the optical constants. The influence of the instrumental sensivity on the results is also analyzed. The measurement and analytical method based on PME ellipsometry provided here could be useful for material-related and characterization-related research in the field of micro-nano optoelectronics.

Citation Download Citation

Wende Liu, Chi Chen, Qiming Fan, Xi Chen, Chundi Zheng, and Yu Wang "Study of exposure process of photoresist using phase-modulated ellipsometer", Proc. SPIE 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 84170I (15 October 2012); https://doi.org/10.1117/12.970644

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KEYWORDS

Photoresist materials

Optical filters

Ellipsometry

Modulation

Optical testing

Analytical research

Refractive index

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