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15 October 2012 Study on the measurement of thin film thickness with fringe scanning method
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Proceedings Volume 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 84170Z (2012) https://doi.org/10.1117/12.973702
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China
Abstract
Optical interferometry is a proven high-precision measurement technology, this paper collect interference fringe pattern of the measured film with phase-shift and shear principle based on optical interferometry and digital image processing, obtain multiple interferogram through control phase shifter in the same step to strike the average phase value,then achieve thin film thickness measurement. The kernel of this technology is to obtain necessary phase parameter by processing interferogram with reasonable algorithm and software. Preprocessing the collected image, including noise elimination, skew correction and contrast enhancement to get clear interference fringe pattern, and strike the main phase value through phase shift algorithm. Phase unwrapping the interferogram as for the distribution in a rang of (-π,π) to restore a continuous wave front phase, get surface shape distribution and thickness information of the thin film. The results show that this method of measuring film thickness is not only having high processing precision, but also having the advantages of non-contact measurement.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jun-hong Su, Ying Shi, and Bing-cai Liu "Study on the measurement of thin film thickness with fringe scanning method", Proc. SPIE 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 84170Z (15 October 2012); https://doi.org/10.1117/12.973702
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