15 October 2012 Design of aberration compensation element for the measurement of diffraction efficiency of the beam sampling grating
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Proceedings Volume 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 84172M (2012) https://doi.org/10.1117/12.975949
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China
Abstract
A diffraction optical element (DOE) is designed to compensate the aberration induced by beam sampling grating (BSG), for analyzing the uniformity of diffraction efficiency of BSG quickly and accurately. So it is suitable for a matrix CCD to receive the aberration-free diffraction beam in the defocusing position directly. The DOE with the same size of the BSG is placed closly to the BSG, and the fringes of the DOE can be obtained by computer generated hologram based on holographic interference. Using genetic algorithm, the spatial frequency of the hologram is determined to meet the process constraint of laser directly writing by changing parameters of the measurement path. The fringe distribution of the hologram for laser direct writing can be calculated according to the iterative algorithm.
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Hao Sun, Hao Sun, "Design of aberration compensation element for the measurement of diffraction efficiency of the beam sampling grating", Proc. SPIE 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 84172M (15 October 2012); doi: 10.1117/12.975949; https://doi.org/10.1117/12.975949
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