15 October 2012 Study on stress birefringence measurement of uni-axial crystal
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Proceedings Volume 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 84172R (2012) https://doi.org/10.1117/12.2002560
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China
Abstract
Residual stress birefringence in crystal will affect frequency conversion efficiency and beam quality. In this paper the distribution characteristics of inherent stress birefringence in crystal is analyzed, through delicate adjustment the optical axis is oriented and qualitative results obtained for KDP crystals are presented and discussed by imaging digital stress measurement instrument, and the stress gradient distribution is calculated, also the effect of deviation from optical axis on the measured stress distribution results is discussed.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xiaohong Wei, Xiaohong Wei, Liqun Chai, Liqun Chai, Qiang Li, Qiang Li, Bo Gao, Bo Gao, } "Study on stress birefringence measurement of uni-axial crystal", Proc. SPIE 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 84172R (15 October 2012); doi: 10.1117/12.2002560; https://doi.org/10.1117/12.2002560
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