Research progress of wavefront aberration metrology equipment of lithography projection lens

Changsong Yu; Yang Xiang

doi:10.1117/12.975809

15 October 2012 Research progress of wavefront aberration metrology equipment of lithography projection lens

Changsong Yu, Yang Xiang

Proceedings Volume 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 84173W (2012) https://doi.org/10.1117/12.975809
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China

Abstract

The wavefront aberration of lithography projection lens is very important performance parameter. High-accuracy interferometer is a cornerstone requirement for the success of projection lithography lens. Recent development of the international high-accuracy wavefront aberration metrology technology of projection lens is described. Several high-accuracy measurement methods based on phase measurement interferometry (PMI) principle of lens wavefront aberrations are analyzed and compared and the merits and demerits of these measurement methods are also discussed. The dominating test technology types of mainstream companies and research organizations as well as their performance parameters are reviewed. Moreover, the performance and key technologies of point diffraction interferometer (PDI) and lateral shearing interferometer (LSI) are emphatically analyzed. Finally, the trend of high-precision system wavefront aberration test technique is described.

Citation Download Citation

Changsong Yu and Yang Xiang "Research progress of wavefront aberration metrology equipment of lithography projection lens", Proc. SPIE 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 84173W (15 October 2012); https://doi.org/10.1117/12.975809

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