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15 October 2012 Synchronous control strategy of wafer and reticle stage of step and scan lithography
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Abstract
For step and scan lithography systems, the synchronization of reticle stage and wafer stage during exposure is one of the most important factors that decides the image quality. In this paper, their principle is analyzed through investigating the structure of step and scan lithography systems. And the coarse and fine laminated model is built. Based on this model, three different kinds of synchronous control structures containing parallel, series and cross-coupled are proposed. Then, the reticle stage is used to compensate the error of the synchronous control system of wafer and reticle stage. Simulation results demonstrate that this control strategy has good synchronization performance, and the synchronous error of wafer stage and reticle stage is less than 0.5nm without disturbance.
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Lanlan Li, Song Hu, Lixin Zhao, and Ping Ma "Synchronous control strategy of wafer and reticle stage of step and scan lithography", Proc. SPIE 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems, 84180M (15 October 2012); https://doi.org/10.1117/12.971476
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