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15 October 2012 Constant exposure control algorithm for laser direct writing of mesh pattern in a deep concave spherical substrate
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Abstract
For fabricating high-quality mesh pattern in a deep concave spherical substrate by laser direct writing technique, the exposure dose must be kept constant during the whole scanning process. The principle of the equipment for fabricating mesh pattern in a deep concave spherical substrate via laser direct writing technique was introduced. And the formulas that express the mathematical relationships between the dimension of the substrate, parameters of mesh pattern and the scanning velocity have been deduced by analyzing motion state for scanning arbitrary latitude line. And the mathematical model of scanning motion with constant exposure dose was built. Then the servo control system including software and hardware was developed. The scanning angular velocity could be tuned precisely according to line’s latitude by the control system, which could maintain the linear velocity invariantly to keep the exposure dose constant, so the lines’ quality could be improved. Mesh pattern with 500 μm gridding period was written in a deep concave spherical substrate with a rise-span ratio 0.31 utilizing the control algorithm. After development, the lines on the substrate have good uniformity, and there steep and straight side walls parallel to each other, error of linewidth and gridding period is within ±1% and ±5%, respectively.
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Fengchao Liang and Jinsong Gao "Constant exposure control algorithm for laser direct writing of mesh pattern in a deep concave spherical substrate", Proc. SPIE 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems, 841812 (15 October 2012); https://doi.org/10.1117/12.978211
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