15 October 2012 Subwavelength patterning based on a surface plasmon resonant cavity
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Abstract
With the development of Super Large Scale Integration (SLSI) and integrated optics, high-resolution photolithography has become more and more important. Traditional photolithography is limited by the optical diffraction of the system. Recent discovery of extraordinary behaviors of the surface plasmon polaritons suggests a novel method of photolithography beyond the diffraction limit. In this paper, we report on a novel subwavelength nanolithography technique using a surface plasmonic resonant cavity formed by two metallic layers separated by a photoresist layer with two incident beams illuminating from two sides. Finite-difference time-domain (FDTD) simulations show that a two-dimensional (2D) dot array pattern with a period of 70 nm can be obtained using an exposure radiation of 436nm wavelength. It is also found that the period of the 2D dot array is tunable which can be implemented by varying the cavity length.
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Genhua Chen, Genhua Chen, Chinhua Wang, Chinhua Wang, Wei Xiao, Wei Xiao, Fuyang Xu, Fuyang Xu, Yiming Lou, Yiming Lou, Bing Cao, Bing Cao, Guiju Zhang, Guiju Zhang, } "Subwavelength patterning based on a surface plasmon resonant cavity", Proc. SPIE 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems, 841813 (15 October 2012); doi: 10.1117/12.975807; https://doi.org/10.1117/12.975807
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