Lateral shearing interferometry applied for phase measurement in wavefront coherent synthesis

Yao Hu; Wei Wang

doi:10.1117/12.974986

15 October 2012 Lateral shearing interferometry applied for phase measurement in wavefront coherent synthesis

Yao Hu, Wei Wang

Proceedings Volume 8420, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical System Technologies for Manufacturing and Testing; 84200Y (2012) https://doi.org/10.1117/12.974986
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China

Abstract

Wavefront coherent synthesis is widely desired in several important laser systems. Meanwhile, with the help of laser, the following engineering problems can be converted into phase measurement in wavefront coherent synthesis: mirror tiling in large scale astronomical telescopes, and planar diffraction grating tiling in laser pulse compression. The main task for phase measurement in wavefront coherent synthesis is to measure the phase difference between synthesized wavefronts in the form of transmission direction error and piston phase error. In this paper, phase measurement for wavefront coherent synthesis based on lateral shearing interferometer is proposed. No reference beam is necessary so the system is simply structured. Simulations were performed to deduce the quantitative relationship between interferograms and phase errors. A demonstration experiment system of planar mirror tiling was set up. Coherent synthesis of monochromatic wavefront was achieved with transmission direction error of 2″ and piston phase error of 1/20 of the wavelength, with the encircled energy of the far-field diffraction pattern higher than 92.9% of the ideal case.

Citation Download Citation

Yao Hu and Wei Wang "Lateral shearing interferometry applied for phase measurement in wavefront coherent synthesis", Proc. SPIE 8420, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical System Technologies for Manufacturing and Testing, 84200Y (15 October 2012); https://doi.org/10.1117/12.974986

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KEYWORDS

Phase measurement

Wavefronts

Mirrors

Monochromatic aberrations

Interferometry

Far-field diffraction

Pulsed laser operation

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