15 October 2012 Effect of wet chemical treatment on BK-7 substrate
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Proceedings Volume 8420, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical System Technologies for Manufacturing and Testing; 84201L (2012) https://doi.org/10.1117/12.978283
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China
Abstract
Surface cleanness and roughness to BK-7 substrates are important factors affecting the performance of laser optics. The conventional RCA cleaning method is widely used in removing particles from substrate surface, with high removal efficiency but rough surface. Therefore, more precise control of the chemical cleaning performance of BK-7 substrate is required than what is available today. In this study, four groups of BK-7 samples were dealt with different cleaning treatments to explore the effects of chemical solutions. The influences of chemical solutions on removal efficiency, etching depth and surface roughness were studied. An optimal cleaning method of BK-7 substrates was proposed, which could remove contaminations completely and gets smoother surface.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xiaowen Ye, Tao Ding, Xinbin Cheng, Bin Ma, Zhengxiang Shen, Jinlong Zhang, Huasong Liu, Yiqin Ji, Zhanshan Wang, "Effect of wet chemical treatment on BK-7 substrate", Proc. SPIE 8420, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical System Technologies for Manufacturing and Testing, 84201L (15 October 2012); doi: 10.1117/12.978283; https://doi.org/10.1117/12.978283
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