Paper
17 October 2012 Design and fabrication of SU-8 MEMS electrostatically tunable optical Fabry-Perot cavity based on photolithography technique
L. Mehrvar, S. Nouri, M. Taghavi, F. Beygi Azar, M. Sadegh Cheri, M. I. Zibaii, M. H. Ghezelaiagh, H. Latifi
Author Affiliations +
Proceedings Volume 8421, OFS2012 22nd International Conference on Optical Fiber Sensors; 84212M (2012) https://doi.org/10.1117/12.966338
Event: OFS2012 22nd International Conference on Optical Fiber Sensor, 2012, Beijing, China
Abstract
In this paper, we report a design and fabrication of MEMS electrostatically tunable Fabry-Perot (METFP) cavity sensor. The mirror of METFP sensor is fabricated by SU-8 photoresist for the first time. The sensor is the combination of optical fiber and microelectromechanical systems (MEMS) technologies. The voltage sensitivity of METFP is 0.036 nm/V and the resolution of voltage measurement is 0.277 V.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
L. Mehrvar, S. Nouri, M. Taghavi, F. Beygi Azar, M. Sadegh Cheri, M. I. Zibaii, M. H. Ghezelaiagh, and H. Latifi "Design and fabrication of SU-8 MEMS electrostatically tunable optical Fabry-Perot cavity based on photolithography technique", Proc. SPIE 8421, OFS2012 22nd International Conference on Optical Fiber Sensors, 84212M (17 October 2012); https://doi.org/10.1117/12.966338
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KEYWORDS
Microelectromechanical systems

Sensors

Fabry–Perot interferometers

Mirrors

Photoresist materials

Electrodes

Fabrication

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