1 May 2012 Fabrication of 70nm split ring resonators by nanoimprint lithography
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Abstract
We report on the fabrication of 70 nm wide, high resolution rectangular U-shaped split ring resonators (SRRs) using nanoimprint lithography (NIL). The fabrication method for the nanoimprint stamp does not require dry etching. The stamp is used to pattern SRRs in a thin PMMA layer followed by metal deposition and lift-off. Nanoimprinting in this way allows high resolution patterns with a minimum feature size of 20 nm. This fabrication technique yields a much higher throughput than conventional e-beam lithography and each stamp can be used numerous times to imprint patterns. Reflectance measurements of fabricated aluminium SRRs on silicon substrates show a so-called an LC resonance peak in the visible spectrum under transverse electric polarisation. Fabricating the SRRs by NIL rather than electron beam lithography allows them to be scaled to smaller dimensions without any significant loss in resolution, partly because pattern expansion caused by backscattered electrons and the proximity effect are not present with NIL. This in turn helps to shift the magnetic response to short wavelengths while still retaining a distinct LC peak.
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Graham J. Sharp, Ali Z. Khokhar, Nigel P. Johnson, "Fabrication of 70nm split ring resonators by nanoimprint lithography", Proc. SPIE 8423, Metamaterials VII, 84230H (1 May 2012); doi: 10.1117/12.922750; https://doi.org/10.1117/12.922750
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