25 April 2012 Absorbing photonic crystals for mono-crystalline silicon thin film solar cells
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Abstract
In this paper, we present the integration of an absorbing photonic crystal within a monocrystalline silicon thin film solar cell stack. Optical simulations performed on a complete solar cell revealed that patterning the epitaxial monocrystalline silicon active layer as a 1D and 2D photonic crystal enabled to increase its integrated absorption by 38%rel and 50%rel in the whole 300-1100 nm range, compared to a similar but unpatterned stack. In order to fabricate such promising cells, a specific fabrication process based on holographic lithography, inductively coupled plasma etching and reactive ion etching has been developed and implemented to obtain such photonic crystal patterned solar cells. Optical measurements performed on the patterned stacks highlight the significant absorption enhancement, as expected by simulation. A more advanced structuration combining a front and a rear 1D binary photonic patterning with different periods is designed, enabling a 60%abs larger absorption in silicon.
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Xianqin Meng, Xianqin Meng, Valerie Depauw, Valerie Depauw, Guillaume Gomard, Guillaume Gomard, Ounsi El Daif, Ounsi El Daif, Christos Trompoukis, Christos Trompoukis, Emmanuel Drouard, Emmanuel Drouard, Cécile Jamois, Cécile Jamois, Alain Fave, Alain Fave, Frederic Dross, Frederic Dross, Ivan Gordon, Ivan Gordon, Christian Seassal, Christian Seassal, } "Absorbing photonic crystals for mono-crystalline silicon thin film solar cells", Proc. SPIE 8425, Photonic Crystal Materials and Devices X, 84250R (25 April 2012); doi: 10.1117/12.922428; https://doi.org/10.1117/12.922428
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