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8 May 2012 Pattern definition by nanoimprint
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Abstract
Nanoimprint is addressed as a novel technique to define nanometer-scaled patterns, in view of largely regular patterns as typical for photonic devices. The main techniques, thermal nanoimprint and ultraviolet nanoimprint, are characterized with respect to their system parameters as well as their processing parameters. Based on simple analytical equations the most important issues for these nanoimprint techniques are discussed and brought into a quantified form. A major impact is laid on the pattern size dependence and the need for anti-sticking precautions. The former, though not of basic impact for the highly regular devices in photonics, shows up when positive or negative type stamps are used. The latter is an ultimate must for successful separation of the imprinted sample from the stamp. It is aimed to assist the reader in developing its own critical view of nanoimprint, in the most positive sense possible. There is no doubt that photonic devices are one of the pattern types most suitable for successful definition by nanoimprint when the guidelines developed here are followed.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hella-Christin Scheer "Pattern definition by nanoimprint", Proc. SPIE 8428, Micro-Optics 2012, 842802 (8 May 2012); https://doi.org/10.1117/12.922722
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