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8 May 2012 Fabrication of near- or mid-infrared wire-grid polarizers with WSi wires
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Abstract
We fabricated a subwavelength-grating structure on the Y2O3 ceramic substrate, which has higher transparency than silicon in the mid-infrared range. After coating a photoresist on this substrate, we formed a grating pattern of 350-nm pitch by the two-beam interference of the He-Cd laser (325-nm wavelength). By using this photoresist grating as a mask, WSi was etched with reactive SF6 ions. The transmittance of the transverse magnetic (TM) polarization was greater than 70% in the 3-7-μm wavelength range without antireflection films and the extinction ratio was over 20 dB in the 2.5-5-μm wavelength range. In addition, we also fabricated near-infrared wire-grid polarizer consisting of a 230-nm pitch WSi grating on a SiO2 substrate. The TM polarization transmittance of the fabricated polarizer exceeded 80% in the 1000-1600-nm wavelength range. The extinction ratio was higher than 20 dB in the 650-1500-nm wavelength range.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Itsunari Yamada, Kohei Fukumi, Junji Nishii, and Mitsunori Saito "Fabrication of near- or mid-infrared wire-grid polarizers with WSi wires", Proc. SPIE 8428, Micro-Optics 2012, 84281A (8 May 2012); https://doi.org/10.1117/12.919758
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