Paper
10 May 2012 Design, fabrication, and characterisation of fully etched TM grating coupler for photonic integrated system-in-package
Oriol Gili-de-Villasante, Paul Tcheg, Bei Wang, Alpaslan Suna, Giannis Giannoulis, Ioannis Lazarou, Dimitrios Apostolopoulos, Hercules Avramopoulos, Nikos Pleros, Matthias Baus, Matthias Karl, Tolga Tekin
Author Affiliations +
Abstract
Grating couplers are the best solution for testing nano-photonic circuits. Their main benefit is that they allow access via an optical fiber from the top and therefore there is no need to dice the chip and prepare the facets crucially. In the PLATON project grating couplers were designed to couple TM mode into and out of the SOI waveguides. Simulations came up with a grating coupler layout capable of theoretical coupling losses lower than 3dB for 1550 nm in TM configuration. A fully etched grating structure was chosen for fabrication simplicity and the optimal filling factor was found. The structures were fabricated using proximity error correction (PEC) and show a uniform coupling efficiency for all couplers. Therefore they are well-suited for all applications which demand for stable fiber-to-chip coupling. The spectral response of the structures was measured from 1500 to 1580 nm with 2 nm step and measuring the fiber-tofiber losses of three straight waveguides equipped with three grating couplers with different gap widths. The optimal grating period exhibits adequate coupling losses of 3.23 dB per coupler at 1557 nm, being therefore the most promising design.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Oriol Gili-de-Villasante, Paul Tcheg, Bei Wang, Alpaslan Suna, Giannis Giannoulis, Ioannis Lazarou, Dimitrios Apostolopoulos, Hercules Avramopoulos, Nikos Pleros, Matthias Baus, Matthias Karl, and Tolga Tekin "Design, fabrication, and characterisation of fully etched TM grating coupler for photonic integrated system-in-package", Proc. SPIE 8431, Silicon Photonics and Photonic Integrated Circuits III, 84310G (10 May 2012); https://doi.org/10.1117/12.922846
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KEYWORDS
Waveguides

Silicon

Optical design

Optical interconnects

Critical dimension metrology

CMOS technology

Continuous wave operation

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