29 June 2012 Layout and reticle verification for FPD
Author Affiliations +
Proceedings Volume 8441, Photomask and Next-Generation Lithography Mask Technology XIX; 84410M (2012) https://doi.org/10.1117/12.981996
Event: Photomask and NGL Mask Technology XIX, 2012, Yokohama, Japan
Flat panel display (fpd) design needs further improving of design quality and efficiency due to aggressive market needs like fast growing 3d panel, big screen for tv. In this paper, we explain the specialized verification technology for panel layout, reticle of fpd whcich enable to reduce the respin and design tat.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Makoto Takagi, Makoto Takagi, Kouji Yamaguchi, Kouji Yamaguchi, Hideki Chida, Hideki Chida, Tsuneo Munakata, Tsuneo Munakata, Nobuto Ono, Nobuto Ono, } "Layout and reticle verification for FPD", Proc. SPIE 8441, Photomask and Next-Generation Lithography Mask Technology XIX, 84410M (29 June 2012); doi: 10.1117/12.981996; https://doi.org/10.1117/12.981996

Back to Top