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29 June 2012 Maskshop data preparation and quality control: from supplier management viewpoint
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Proceedings Volume 8441, Photomask and Next-Generation Lithography Mask Technology XIX; 84410T (2012) https://doi.org/10.1117/12.964097
Event: Photomask and NGL Mask Technology XIX, 2012, Yokohama, Japan
Abstract
In semiconductor industry, many wafer fabs acquire masks from qualified suppliers because they do not have in-house maskshops. Under the circumstances, for these fabs, their main objectives of mask supplier management are to carry out gaining stable quality performance with punctual delivery and acceptable prices. At present, interests in mask supplier management are launching into mask data preparation (MDP) field when it's beginning to face raised challenges to output correct results all the time. These incoming tasks are mainly due to increasingly complicated MDP demand from wafer fabs for implementing various approaches on masks and tape-out to support wafer production and tight cycle-time control. In this paper, it shows major factors of MDP quality issues from analyzing past accidents in our suppliers and proposes possible approaches for achieving further improvement.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Erwin Deng, Rachel Lee, and Chun Der Lee "Maskshop data preparation and quality control: from supplier management viewpoint", Proc. SPIE 8441, Photomask and Next-Generation Lithography Mask Technology XIX, 84410T (29 June 2012); https://doi.org/10.1117/12.964097
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