29 June 2012 Study on storage components and application performance for mask haze prevention
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Proceedings Volume 8441, Photomask and Next-Generation Lithography Mask Technology XIX; 84410Z (2012) https://doi.org/10.1117/12.964254
Event: Photomask and NGL Mask Technology XIX, 2012, Yokohama, Japan
Abstract
The amount of sulfate ion on mask surface will increase haze defect growing once exposed by an ArF laser. And then the storage conditions influence amount of sulfate ion was investigated. Therefore, our evaluations used extraction method and IC (Ion Chromatography) test to examine the amount of ions for current mask pods and storage cabinet. The pods included the different material of ABS (Amber and Violet Acrylonitrile Butadiene Styrene), PMMA (Polymethyl meth acrylate), PEEK (Polyether ether ketone), Metal case, LCP (Liquid Crystal Plastic), PC+CF (Polycarbonate with carbon fiber) and PC+CNT (Polycarbonate with Carbon nano-tubes). Moreover, PSM (Phase shift Mask) haze life time and dosage was strongly interrelated with the amount of chemical contaminant aggregation for storage pods. The other factor to impact haze generation of ArF PSM masks is the condition of storage environment; therefore, we're comparing the different structure of cabinet from different vendors to extend mask life time. They included 3 types of storage system: cabinet with XCDA, purge cabinet and purge stocker. According to this point of view, we used the impinger and Cr Blank IC test to verify the best storage system and remove some of the polluted parts for cabinet to ensure haze free. Resulting from our investigations, we setup storage BKM (Best Known Method) and monitor haze performance to record their results. Consequently, the optimization components of storages will contribute the enormously economical benefit.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shu Li Chen, Shu Li Chen, T. Y. Fang, T. Y. Fang, Ryan Lai, Ryan Lai, Chun Der Lee, Chun Der Lee, Shang Hao Yeh, Shang Hao Yeh, Timmy Chen, Timmy Chen, } "Study on storage components and application performance for mask haze prevention", Proc. SPIE 8441, Photomask and Next-Generation Lithography Mask Technology XIX, 84410Z (29 June 2012); doi: 10.1117/12.964254; https://doi.org/10.1117/12.964254
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