29 June 2012 Applications of MRC software for efficient mask manufacturing
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Proceedings Volume 8441, Photomask and Next-Generation Lithography Mask Technology XIX; 84411D (2012) https://doi.org/10.1117/12.970256
Event: Photomask and NGL Mask Technology XIX, 2012, Yokohama, Japan
Abstract
Since the layout patterns on photomasks have been getting more and more complicated by OPC/RET processes, the mask patterns need to go through the verification to check the mask manufacturability even though the layout is 'DRC clean'. This verification process is called MRC (mask rule check). The fundamental functions required for MRC is relatively simple, such as narrow gap detection between patterns. SII NanoTechnology has been developing an MRC software product, SmartMRCTM, and it is widely used in mask shops as MRC standard software. Recently, in addition to typical usages of MRC software, various realistic applications have been reported in order to solve problems related to mask fabrication process. In this paper, we introduce three applications of MRC software for more efficient mask manufacturing.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kokoro Kato, Yoshiyuki Taniguchi, Kuninori Nishizawa, Tadao Inoue, "Applications of MRC software for efficient mask manufacturing", Proc. SPIE 8441, Photomask and Next-Generation Lithography Mask Technology XIX, 84411D (29 June 2012); doi: 10.1117/12.970256; https://doi.org/10.1117/12.970256
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