17 September 2012 Progress with MEMS x-ray micro pore optics
Author Affiliations +
Our development of ultra light-weight X-ray micro pore optics based on MEMS (Micro Electro Mechanical System) technologies is described. Using dry etching or X-ray lithography and electroplating, curvilinear sidewalls through a flat wafer are fabricated. Sidewalls vertical to the wafer surface are smoothed by use of high temperature annealing and/or magnetic field assisted finishing to work as X-ray mirrors. The wafer is then deformed to a spherical shape. When two spherical wafers with different radii of curvature are stacked, the combined system will be an approximated Wolter type-I telescope. This method in principle allows high angular resolution and ultra light-weight X-ray micro pore optics. In this paper, performance of a single-stage optic, coating of a heavy metal on sidewalls with atomic layer deposition, and assembly of a Wolter type-I telescope are reported.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuichiro Ezoe, Yuichiro Ezoe, Teppei Moriyama, Teppei Moriyama, Tomohiro Ogawa, Tomohiro Ogawa, Takuya Kakiuchi, Takuya Kakiuchi, Takaya Ohashi, Takaya Ohashi, Ikuyuki Mitsuishi, Ikuyuki Mitsuishi, Kazuhisa Mitsuda, Kazuhisa Mitsuda, Mitsuhiro Horade, Mitsuhiro Horade, Susumu Sugiyama, Susumu Sugiyama, Raul E. Riveros, Raul E. Riveros, Hitomi Yamaguchi, Hitomi Yamaguchi, Yoshiaki Kanamori, Yoshiaki Kanamori, Kohei Morishita, Kohei Morishita, Kazuo Nakajima, Kazuo Nakajima, Ryutaro Maeda, Ryutaro Maeda, } "Progress with MEMS x-ray micro pore optics", Proc. SPIE 8443, Space Telescopes and Instrumentation 2012: Ultraviolet to Gamma Ray, 84430U (17 September 2012); doi: 10.1117/12.925811; https://doi.org/10.1117/12.925811


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