Uniform coating of high aspect ratio surfaces through atomic layer deposition

Mark Nolan; Ian Povey; Simon Elliot; Nicolas Cordero; Martyn Pemble; Brian Shortt; Marcos Bavdaz

doi:10.1117/12.924876

27 September 2012 Uniform coating of high aspect ratio surfaces through atomic layer deposition

Mark Nolan, Ian Povey, Simon Elliot, Nicolas Cordero, Martyn Pemble, Brian Shortt, Marcos Bavdaz

Proceedings Volume 8443, Space Telescopes and Instrumentation 2012: Ultraviolet to Gamma Ray; 84433O (2012) https://doi.org/10.1117/12.924876
Event: SPIE Astronomical Telescopes + Instrumentation, 2012, Amsterdam, Netherlands

Abstract

Innovative X-ray ray imaging optic technologies, Silicon Pore Optics for example, are often characterised by large length to pore diameter aspect ratios. Such ratios present challenges to the deposition of reflectivity enhancing metallic coatings onto the mirror substrate surfaces. The technique of Atomic Layer Deposition (ALD) is perfectly suited to addressing this challenge due to the inherent self-limiting nature of the process which yields highly uniform coatings with surface roughness compatible with the requirements of high resolution X-ray imaging. We describe the results of a project aimed at developing an optimised ALD reactor and process to coat the internal wall surfaces of high aspect ratio samples with a uniform and smooth metallic layer. For sample substrates of aspect ratio ~100 the reactor has realised an average gradient of 1nm in the thickness of an Al₂O₃ coating on the internal walls of a 76 mm long glass tube.

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Mark Nolan, Ian Povey, Simon Elliot, Nicolas Cordero, Martyn Pemble, Brian Shortt, and Marcos Bavdaz "Uniform coating of high aspect ratio surfaces through atomic layer deposition", Proc. SPIE 8443, Space Telescopes and Instrumentation 2012: Ultraviolet to Gamma Ray, 84433O (27 September 2012); https://doi.org/10.1117/12.924876

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KEYWORDS

Atomic layer deposition

Coating

Iridium

X-ray optics

Silicon

Glasses

Mirrors

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