10 October 2012 Advances in DNA photonics
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Abstract
In this paper we present our current research in exploring a DNA biopolymer for photonics applications. A new processing technique has been adopted that employs a modified soxhlet-dialysis (SD) rinsing technique to completely remove excess ionic contaminants from the DNA biopolymer, resulting in a material with greater mechanical stability and enhanced performance reproducibility. This newly processed material has been shown to be an excellent material for cladding layers in poled polymer electro-optic (EO) waveguide modulator applications. Thin film poling results are reported for materials using the DNA biopolymer as a cladding layer, as are results for beam steering devices also using the DNA biopolymer. Finally, progress on fabrication of a Mach Zehnder EO modulator with DNA biopolymer claddings using nanoimprint lithography techniques is reported.
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Emily M. Heckman, Emily M. Heckman, Roberto S. Aga, Roberto S. Aga, Emily M. Fehrman Cory, Emily M. Fehrman Cory, Fahima Ouchen, Fahima Ouchen, Alyssa Lesko, Alyssa Lesko, Brian Telek, Brian Telek, Jack Lombardi, Jack Lombardi, Carrie M. Bartsch, Carrie M. Bartsch, James G. Grote, James G. Grote, } "Advances in DNA photonics", Proc. SPIE 8464, Nanobiosystems: Processing, Characterization, and Applications V, 84640P (10 October 2012); doi: 10.1117/12.930873; https://doi.org/10.1117/12.930873
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