19 October 2012 Plasma enhanced atomic layer deposition of silver thin films for applications in plasmonics and surface enhanced Raman scattering
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Abstract
We have employed plasma-enhanced atomic layer deposition (PEALD) as a means to create multi-layered nanocomposite structures in order to enhance the plasmonic behavior and SERS response in the detection of benzenethiol (BZT). Ag PEALD films were deposited within nanoporous anodic aluminum oxide (AAO) templates of various pore depths, using Ag(fod)(PEt3)(fod=2,2-dimethyl-6,6,7,7,8,8,8-heptafluorooctane-3,5-dionato) as the precursor. We have examined the polycrystalline microstructure and conformality of the Ag films across the surface of an AAO template as well as into the pores, which varies significantly as thicknesses decrease. Furthermore, we investigated the plasmonic behavior of these films by performing SERS as a function of the Ag microstructure and conformality within the nanopores, using a 785 nm laser excitation and BZT as a test molecule, which forms a self-assembled monolayer on the Ag surface.
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Erin R. Cleveland, Orest Glembocki, S. M. Prokes, "Plasma enhanced atomic layer deposition of silver thin films for applications in plasmonics and surface enhanced Raman scattering", Proc. SPIE 8467, Nanoepitaxy: Materials and Devices IV, 84670H (19 October 2012); doi: 10.1117/12.929033; https://doi.org/10.1117/12.929033
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