13 September 2012 Metal substrates with nanometer scale surface roughness for flexible electronics
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Abstract
In this work, we present a novel way in fabricating a metal substrate with nanometer scale in surface roughness (Ra < 1 nm) using a surface roughness transfer method without any polishing or planarization process. Ag film (8 inch, Ra = 0.57 nm) and an INVAR (Invariable alloy) one (20 cm × 20 cm, Ra = 1.40 nm) were demonstrated. The INVAR film was used as a substrate for fabricating organic light emitting diodes (OLED) and organic photovoltaic (OPV). The optical and electrical characteristics of OLEDs and OPVs using the INVAR were comparable to those using a conventional ITO glass substrate.
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Jong-Lam Lee, Kisoo Kim, "Metal substrates with nanometer scale surface roughness for flexible electronics", Proc. SPIE 8476, Organic Light Emitting Materials and Devices XVI, 847614 (13 September 2012); doi: 10.1117/12.928659; https://doi.org/10.1117/12.928659
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