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13 September 2012Organic solvent wetting properties of UV and plasma treated ZnO nanorods: printed electronics approach
Due to low manufacturing costs, printed organic solar cells are on the short-list of renewable and environmentally-
friendly energy production technologies of the future. However, electrode materials and each photoactive layer
require different techniques and approaches. Printing technologies have attracted considerable attention for organic electronics due to their potentially high volume and low cost processing. A case in point is the interface
between the substrate and solution (ink) drop, which is a particularly critical issue for printing quality. In
addition, methods such as UV, oxygen and argon plasma treatments have proven suitable to increasing the hydrophilicity of treated surfaces. Among several methods of measuring the ink-substrate interface, the simplest and
most reliable is the contact angle method. In terms of nanoscale device applications, zinc oxide (ZnO) has gained
popularity, owing to its physical and chemical properties. In particular, there is a growing interest in exploiting the unique properties that the so-called nanorod structure exhibits for future 1-dimensional opto-electronic
devices. Applications, such as photodiodes, thin-film transistors, sensors and photo anodes in photovoltaic cells
have already been demonstrated. This paper presents the wettability properties of ZnO nanorods treated with
UV illumination, oxygen and argon plasma for various periods of time. Since this work concentrates on solar cell
applications, four of the most common solutions used in organic solar cell manufacture were tested: P3HT:PCBM
DCB, P3HT:PCBM CHB, PEDOT:PSS and water. The achieved results prove that different treatments change
the contact angle differently. Moreover, solvent behaviour varied uniquely with the applied treatment.