19 October 2012 Low-cost Fresnel microlens array fabricated by a home-built maskless lithography system
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This work presents the fabrication of a high fill factor Fresnel microlens array (MLA) by employing a low-cost homebuilt maskless exposure lithographic system. A phase relief structure was generated on a photoresist-coated silicon wafer, replicated in Polydimethylsiloxane (PDMS) and electrostatically bonded to a glass substrate. Optical characterization was based on the evaluation of the maximum intensity of each spot generated at the MLA focal plane as well as its full width at half maximum (FWHM) intensity values. The resulting FWHM and maximum intensity spot mean values were 50 ± 8% μm and 0.71 ± 7% a.u , respectively. Such a MLA can be applied as Shack-Hartmann wavefront sensors, in optical interconnects and to enhance the efficiency of detector arrays.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
G. A. Cirino, G. A. Cirino, S. A. Lopera, S. A. Lopera, A. N. Montagnoli, A. N. Montagnoli, L. G. Neto, L. G. Neto, R. D. Mansano, R. D. Mansano, "Low-cost Fresnel microlens array fabricated by a home-built maskless lithography system", Proc. SPIE 8489, Polymer Optics and Molded Glass Optics: Design, Fabrication, and Materials II, 848908 (19 October 2012); doi: 10.1117/12.928819; https://doi.org/10.1117/12.928819


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