New Sensor System For Optoelectronic Microprofilometry

H. J. Warnecke; R.J. Ahlers; H. Kim

doi:10.1117/12.942845

22 March 1988 New Sensor System For Optoelectronic Microprofilometry

H. J. Warnecke, R.J. Ahlers, H. Kim

Proceedings Volume 0849, Automated Inspection and High-Speed Vision Architectures; (1988) https://doi.org/10.1117/12.942845
Event: Advances in Intelligent Robotics Systems, 1987, Cambridge, CA, United States

Abstract

An optoelectronic sensor system will be presented that measures distances in the range of micrometers. It is based on a triangulation principle and is expected to be integrated into coordinate mea-surement systems for high precision measurement tasks. The system consists of a laser, a linear CCD-array and a special optical system. Thus it is possible to measure complex workpieces that could not be evaluated by tactile means. Special attention is directed to surface roughness and surface tilt. These factors influence the results obtained during a scanning cycle.

Citation Download Citation

H. J. Warnecke, R.J. Ahlers, and H. Kim "New Sensor System For Optoelectronic Microprofilometry", Proc. SPIE 0849, Automated Inspection and High-Speed Vision Architectures, (22 March 1988); https://doi.org/10.1117/12.942845

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