VUV modification of surfaces to induce film formation

Dianne J. Coleman; Kenneth T. Luey

doi:10.1117/12.931009

15 October 2012 VUV modification of surfaces to induce film formation

Dianne J. Coleman, Kenneth T. Luey

Proceedings Volume 8492, Optical System Contamination: Effects, Measurements, and Control 2012; 84920D (2012) https://doi.org/10.1117/12.931009
Event: SPIE Optical Engineering + Applications, 2012, San Diego, California, United States

Abstract

This work presents further evaluation of the mechanisms driving the formation of molecular contaminant films and arrays of droplets on silicon and other types of space system optical surfaces. A simple model is presented describing a competition between the self-cohesive forces of a liquid-like droplet and the adhesive forces between the droplet and surface. We show in this work that irradiation of the silicon surface prior to contaminant deposition increases the adhesive forces, enhancing film formation. However, the surface states achieved by the VUV exposure cannot be reproduced by simple approaches such as solvent wiping. Higher intensity VUV exposure produces a silicon surface that allows film formation for even very pure contaminant analogs with high self-cohesion.

Citation Download Citation

Dianne J. Coleman and Kenneth T. Luey "VUV modification of surfaces to induce film formation", Proc. SPIE 8492, Optical System Contamination: Effects, Measurements, and Control 2012, 84920D (15 October 2012); https://doi.org/10.1117/12.931009

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