13 September 2012 Precision improving of double beam shadow moiré interferometer by phase shifting interferometry for the stress of flexible substrate
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Proceedings Volume 8493, Interferometry XVI: Techniques and Analysis; 84931E (2012); doi: 10.1117/12.929509
Event: SPIE Optical Engineering + Applications, 2012, San Diego, California, United States
Abstract
While tin-doped indium oxide (ITO) has been extensively applied in flexible electronics, the problem of the residual stress has many obstacles to overcome. This study investigated the residual stress of flexible electronics by the double beam shadow moiré interferometer, and focused on the precision improvement with phase shifting interferometry (PSI). According to the out-of-plane displacement equation, the theoretical error depends on the grating pitch and the angle between incident light and CCD. The angle error could be reduced to 0.03% by the angle shift of 10° as a result of the double beam interferometer was a symmetrical system. But the experimental error of the double beam moiré interferometer still reached to 2.2% by the noise of the vibration and interferograms. In order to improve the measurement precision, PSI was introduced to the double shadow moiré interferometer. Wavefront phase was reconstructed by the five interferograms with the Hariharan algorithm. The measurement results of standard cylinder indicating the error could be reduced from 2.2% to less than 1% with PSI. The deformation of flexible electronic could be reconstructed fast and calculated the residual stress with the Stoney correction formula. This shadow moiré interferometer with PSI could improve the precision of residual stress for flexible electronics.
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Kuo-Ting Huang, Hsi-Chao Chen, Ssu-Fan Lin, Ke-Ming Lin, Hong-Ye Syue, "Precision improving of double beam shadow moiré interferometer by phase shifting interferometry for the stress of flexible substrate", Proc. SPIE 8493, Interferometry XVI: Techniques and Analysis, 84931E (13 September 2012); doi: 10.1117/12.929509; https://doi.org/10.1117/12.929509
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KEYWORDS
Interferometers

Flexible circuits

Phase interferometry

Thin films

Wavefronts

Moire patterns

Positron emission tomography

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