15 October 2012 Review of substrate materials, surface metrologies and polishing techniques for current and future-generation EUV/x-ray optics
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Abstract
This manuscript presents a review of recent advances in EUV/x-ray substrate specification, fabrication and metrology for photolithography, synchrotron sources, free-electron laser sources, solar physics and astronomy. Highlights from ultra-low- expansion glass substrates, silicon and silicon carbide substrates are presented. Selected emerging substrate materials and fabrication technologies are also discussed.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Regina Soufli, Regina Soufli, Sherry L. Baker, Sherry L. Baker, Eric M. Gullikson, Eric M. Gullikson, Tom McCarville, Tom McCarville, Jeffrey C. Robinson, Jeffrey C. Robinson, Dennis Martínez-Galarce, Dennis Martínez-Galarce, Mónica Fernández-Perea, Mónica Fernández-Perea, Michael J. Pivovaroff, Michael J. Pivovaroff, } "Review of substrate materials, surface metrologies and polishing techniques for current and future-generation EUV/x-ray optics", Proc. SPIE 8501, Advances in Metrology for X-Ray and EUV Optics IV, 850102 (15 October 2012); doi: 10.1117/12.954852; https://doi.org/10.1117/12.954852
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