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15 October 2012Review of substrate materials, surface metrologies and polishing techniques for current and future-generation EUV/x-ray optics
Regina Soufli,1 Sherry L. Baker,1 Eric M. Gullikson,2 Tom McCarville,1 Jeffrey C. Robinson,1 Dennis Martínez-Galarce,3 Mónica Fernández-Perea,1 Michael J. Pivovaroffhttps://orcid.org/0000-0001-6780-68161
1Lawrence Livermore National Lab. (United States) 2Lawrence Berkeley National Lab. (United States) 3Lockheed Martin Advanced Technology Ctr. (United States)
This manuscript presents a review of recent advances in EUV/x-ray substrate specification, fabrication and metrology for
photolithography, synchrotron sources, free-electron laser sources, solar physics and astronomy. Highlights from ultra-low-
expansion glass substrates, silicon and silicon carbide substrates are presented. Selected emerging substrate
materials and fabrication technologies are also discussed.
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Regina Soufli, Sherry L. Baker, Eric M. Gullikson, Tom McCarville, Jeffrey C. Robinson, Dennis Martínez-Galarce, Mónica Fernández-Perea, Michael J. Pivovaroff, "Review of substrate materials, surface metrologies and polishing techniques for current and future-generation EUV/x-ray optics ," Proc. SPIE 8501, Advances in Metrology for X-Ray and EUV Optics IV, 850102 (15 October 2012); https://doi.org/10.1117/12.954852