Paper
15 October 2012 Methodology for optimal in situ alignment and setting of bendable optics for diffraction-limited focusing of soft x-rays
Daniel J. Merthe, Valeriy V. Yashchuk, Kenneth A. Goldberg, Martin Kunz, Nobumichi Tamura, Wayne R. McKinney, Nikolay A. Artemiev, Richard S. Celestre, Gregory Y. Morrison, Erik Anderson, Brian V. Smith, Edward E. Domning, Senajith B. Rekawa, Howard A. Padmore
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Abstract
We demonstrate a comprehensive and broadly applicable methodology for the optimal in situ configuration of bendable soft x-ray Kirkpatrick-Baez mirrors. The mirrors used for this application are preset at the ALS Optical Metrology Laboratory prior to beamline installation. The in situ methodology consists of a new technique for simultaneously setting the height and pitch angle of each mirror. The benders of both mirrors were then optimally tuned in order to minimize ray aberrations to a level below the diffraction-limited beam waist size of 200 nm (horizontal) × 100 nm (vertical). After applying this methodology, we measured a beam waist size of 290 nm (horizontal) × 130 nm (vertical) with 1 nm light using the Foucault knife-edge test. We also discuss the utility of using a grating-based lateral shearing interferometer with quantitative wavefront feedback for further improvement of bendable optics.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Daniel J. Merthe, Valeriy V. Yashchuk, Kenneth A. Goldberg, Martin Kunz, Nobumichi Tamura, Wayne R. McKinney, Nikolay A. Artemiev, Richard S. Celestre, Gregory Y. Morrison, Erik Anderson, Brian V. Smith, Edward E. Domning, Senajith B. Rekawa, and Howard A. Padmore "Methodology for optimal in situ alignment and setting of bendable optics for diffraction-limited focusing of soft x-rays", Proc. SPIE 8501, Advances in Metrology for X-Ray and EUV Optics IV, 850108 (15 October 2012); https://doi.org/10.1117/12.930023
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Cited by 4 scholarly publications.
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KEYWORDS
Mirrors

Wavefronts

X-rays

In situ metrology

Optical alignment

Charge-coupled devices

Metrology

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