Development of a high-speed nanoprofiler using normal vector tracing

T. Kitayama; H. Matsumura; K. Usuki; T. Kojima; J. Uchikoshi; Y. Higashi; K. Endo

doi:10.1117/12.929221

15 October 2012 Development of a high-speed nanoprofiler using normal vector tracing

T. Kitayama, H. Matsumura, K. Usuki, T. Kojima, J. Uchikoshi, Y. Higashi, K. Endo

Author Affiliations +

Proceedings Volume 8501, Advances in Metrology for X-Ray and EUV Optics IV; 85010A (2012) https://doi.org/10.1117/12.929221
Event: SPIE Optical Engineering + Applications, 2012, San Diego, California, United States

Abstract

A new high-speed nanoprofiler was developed in this study. This profiler measures normal vectors and their coordinates on the surface of a specimen. Each normal vector and coordinate is determined by making the incident light path and the reflected light path coincident using 5-axis controlled stages. This is ensured by output signal of quadrant photo diode (QPD). From the acquired normal vectors and their coordinates, the three-dimensional shape is calculated by a reconstruction algorithm based on least-squares. In this study, a concave spherical mirror with a 400 mm radius of curvature was measured. As a result, a peak of 30 nm PV was observed at the center of the mirror. Measurement repeatability was 1 nm. In addition, cross-comparison with a Fizeau interferometer was implemented and the results were consistent within 10 nm. In particular, the high spatial frequency profile was highly consistent, and any differences were considered to be caused by systematic errors.

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T. Kitayama, T. Kitayama, H. Matsumura, H. Matsumura, K. Usuki, K. Usuki, T. Kojima, T. Kojima, J. Uchikoshi, J. Uchikoshi, Y. Higashi, Y. Higashi, K. Endo, K. Endo, } "Development of a high-speed nanoprofiler using normal vector tracing", Proc. SPIE 8501, Advances in Metrology for X-Ray and EUV Optics IV, 85010A (15 October 2012); doi: 10.1117/12.929221; https://doi.org/10.1117/12.929221

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