Subwavelength photolithography and microscopy

Zeyang Liao; M. Al-Amri; M. Suhail Zubairy

doi:10.1117/12.948435

15 October 2012 Subwavelength photolithography and microscopy

Zeyang Liao, M. Al-Amri, M. Suhail Zubairy

Proceedings Volume 8518, Quantum Communications and Quantum Imaging X; 851803 (2012) https://doi.org/10.1117/12.948435
Event: SPIE Optical Engineering + Applications, 2012, San Diego, California, United States

Abstract

The resolutions of the optical microscope and the optical lithography are both limited by the well-known Rayleigh limit. Rabi oscillation is a coherent nonlinear process that can modulate the population distribution between two energy states and also modulate the resonant fluorescence spectrum. If we have a gradient electric field amplitude in the space, the Rabi frequency for different position is also different. The spatial distribution of the population in the excited state can be modulated and the spatial information of the atoms can also be encoded in the resonant fluorescence spectrum. If the gradient of the field is large enough, the pattern generated can be subwavlength and the atoms with subwavelength distances can also be extracted. Here we present a review on both the subwavelength photolithography and microscopy via Rabi oscillations.

Citation Download Citation

Zeyang Liao, M. Al-Amri, and M. Suhail Zubairy "Subwavelength photolithography and microscopy", Proc. SPIE 8518, Quantum Communications and Quantum Imaging X, 851803 (15 October 2012); https://doi.org/10.1117/12.948435

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