8 November 2012 2012 Mask Industry Survey
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Proceedings Volume 8522, Photomask Technology 2012; 852203 (2012); doi: 10.1117/12.978704
Event: SPIE Photomask Technology, 2012, Monterey, California, United States
Abstract
A survey supported by SEMATECH and administered by David Powell Consulting was sent to semiconductor industry leaders to gather information about the mask industry as an objective assessment of its overall condition. The survey was designed with the input of semiconductor company mask technologists and merchant mask suppliers. 2012 marks the 11th consecutive year for the mask industry survey. This year’s survey and reporting structure are similar to those of the previous years with minor modifications based on feedback from past years and the need to collect additional data on key topics. Categories include general mask information, mask processing, data and write time, yield and yield loss, delivery times, and maintenance and returns. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the mask industry. Results, initial observations, and key comparisons between the 2011 and 2012 survey responses are shown here, including multiple indications of a shift towards the manufacturing of higher end photomasks.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Matt Malloy, Lloyd C. Litt, "2012 Mask Industry Survey", Proc. SPIE 8522, Photomask Technology 2012, 852203 (8 November 2012); doi: 10.1117/12.978704; http://dx.doi.org/10.1117/12.978704
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KEYWORDS
Photomasks

Pellicles

Binary data

Optical proximity correction

Etching

Manufacturing

Semiconductors

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