8 November 2012 Generating well-behaved OASIS files for mask data processing
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Proceedings Volume 8522, Photomask Technology 2012; 85220V (2012); doi: 10.1117/12.964293
Event: SPIE Photomask Technology, 2012, Monterey, California, United States
Since the introduction of OASIS 1.0, the OASIS file format has gradually become adopted across the semiconductor manufacturing industry for advanced technology nodes. However, within the range of possible OASIS format options, choices made during file creation can result in inefficiencies in mask data processing. This paper starts by pointing out the relation between generating OASIS files and mask data preparation runtime. We then present some strategies and methodologies on generating well-behaved OASIS files. We conclude with some comments on the OASIS standard for the future.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. Hung, J. P. Canepa, K. Kuo, J. G. Jou, "Generating well-behaved OASIS files for mask data processing", Proc. SPIE 8522, Photomask Technology 2012, 85220V (8 November 2012); doi: 10.1117/12.964293; http://dx.doi.org/10.1117/12.964293


Data processing

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