8 November 2012 Automatic marking by use of MRCC range pattern matching for advanced MDP
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Proceedings Volume 8522, Photomask Technology 2012; 85220X (2012); doi: 10.1117/12.966809
Event: SPIE Photomask Technology, 2012, Monterey, California, United States
One step in MDP is the process of marking CD features via the jobdeck. These marks are usually further translated into specially formatted files used by optical metrology tools or CD SEM. There are various practices currently in use to accomplish the marking process, e.g.: by eye with a point and click GUI, by script using a list of known coordinates, by searching for a coordinate within a very limited neighborhood of a suspect coordinate, etc. However, all of these methods suffer from various shortcomings. They require extensive user intervention, or not all or enough marking places are found, or the coordinates that are supposed to be known are slightly off and cause mark placement scripts to fail, and so on.This paper details an approach using CATS MRCC-RPM, where a new pattern matching functionality is used to find locations suitable for mark placements. The location coordinates thus found are then passed to well known mark placing functionality to then place the marks.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. Salazar, W. Moore, J. Valadez, "Automatic marking by use of MRCC range pattern matching for advanced MDP", Proc. SPIE 8522, Photomask Technology 2012, 85220X (8 November 2012); doi: 10.1117/12.966809; https://doi.org/10.1117/12.966809

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