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8 November 2012 Particle transport in plasma systems for development of EUVL mask blanks
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Defect transport in development of EUVL mask blanks is an important issue for the near-term of the industry. One main issue affecting transport is how the defect may charge in the presence of plasma. In some cases, plasma may act to contain defects away from the mask surface. We show simulation results of the effect of plasma on defect transport demonstrating how the formation of plasma sheathes and a plasma potential act to confine highly negatively charged particles, such as defect particles would be.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Peter Stoltz, Alex Likhanskii, Chuandong Zhou, Vibhu Jindal, and Patrick Kearney "Particle transport in plasma systems for development of EUVL mask blanks", Proc. SPIE 8522, Photomask Technology 2012, 852210 (8 November 2012); doi: 10.1117/12.979599;

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