In this paper, we will present the needs and mechanisms for simultaneous OPC for both masks, the extra freedom avaliable in DP OPC, and the extra consideration needed in developing LELE OPC recipe such as SRAF insertion. biasing.
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Kellen Arb, Chris Reid, Qiao Li, Evgueni Levine, Pradiptya Ghosh, "OPC and verification for LELE double patterning," Proc. SPIE 8522, Photomask Technology 2012, 85221B (8 November 2012);