8 November 2012 Status of the AIMS(TM) EUV Project
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Proceedings Volume 8522, Photomask Technology 2012; 852220 (2012); doi: 10.1117/12.981345
Event: SPIE Photomask Technology, 2012, Monterey, California, United States
Abstract
In previous conferences the status of the AIMS™ EUV project has been presented in which the basic layout scheme and preliminary design have been shown along with the targeted performance specification levels to be met. Presently the final design milestone of the project has been successfully completed and assembly of the prototype tool is underway. The final design concept will be presented along with the current status of the tool and simulated performance data.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anthony D. Garetto, Jan Hendrik Peters, Sascha Perlitz, Ulrich Matejka, Dirk Hellweg, Markus R. Weiss, "Status of the AIMS(TM) EUV Project", Proc. SPIE 8522, Photomask Technology 2012, 852220 (8 November 2012); doi: 10.1117/12.981345; https://doi.org/10.1117/12.981345
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KEYWORDS
Extreme ultraviolet

Photomasks

Prototyping

Climatology

Manufacturing

Particles

Inspection

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