8 November 2012 Nanoparticle detection limits of TNO's Rapid Nano: modeling and experimental results
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TNO has developed the Rapid Nano scanner to detect nanoparticles on EUVL mask blanks. This scanner was designed to be used in particle qualifications of EUV reticle handling equipment. In this paper we present an end-to-end model of the Rapid Nano detection process. All important design parameters concerning illumination, detection and noise are included in the model. The prediction from the model matches the performance that was experimentally determined (59 nm LSE). The model will be used to design and predict the performance of future generations of particle scanners.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Peter van der Walle, Peter van der Walle, Pragati Kumar, Pragati Kumar, Dmitry Ityaksov, Dmitry Ityaksov, Richard Versulis, Richard Versulis, Diederik J. Maas, Diederik J. Maas, Olaf Kievit, Olaf Kievit, Jochem Janssen, Jochem Janssen, Jacques C. J. van der Donck, Jacques C. J. van der Donck, "Nanoparticle detection limits of TNO's Rapid Nano: modeling and experimental results", Proc. SPIE 8522, Photomask Technology 2012, 85222Q (8 November 2012); doi: 10.1117/12.2006408; https://doi.org/10.1117/12.2006408

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