Optical damage threshold and energy deposition in the embedded nanostructures

Karol A. Janulewicz; Hak Jae Lee; Asep Hapiddin; Bohuslav Matouš; Chul Min Kim; Dickson Joseph; K. E. Geckeler; Peter V. Nickles

doi:10.1117/12.977307

4 December 2012 Optical damage threshold and energy deposition in the embedded nanostructures

Karol A. Janulewicz, Hak Jae Lee, Asep Hapiddin, Bohuslav Matouš, Chul Min Kim, Dickson Joseph, K. E. Geckeler, Peter V. Nickles

Author Affiliations +

Proceedings Volume 8530, Laser-Induced Damage in Optical Materials: 2012; 853006 (2012) https://doi.org/10.1117/12.977307
Event: SPIE Laser Damage, 2012, Boulder, Colorado, United States

Abstract

Results of energy deposition measurement in interaction between an ultra-short laser pulse and nanostructured target are described. As a target we used carbon nanotubes and multilayer graphene deposited on a sapphire wafer surface and embedded in a layer of protein. A 25 fs, p-polarised pulses from a 1 kHz-Ti;sapphire laser of energy up to 3 mJ were focused to give intensity up to 2×10¹⁶ W/cm² on a target positioned within an integrating sphere. The absorption measured showed a level in excess of 80 %, increasing with the intensity. The results suggest that the host material (lysozyme) is responsible for the breakdown while the embedded material contributes dominantly to the absorption.

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Karol A. Janulewicz, Hak Jae Lee, Asep Hapiddin, Bohuslav Matouš, Chul Min Kim, Dickson Joseph, K. E. Geckeler, and Peter V. Nickles "Optical damage threshold and energy deposition in the embedded nanostructures", Proc. SPIE 8530, Laser-Induced Damage in Optical Materials: 2012, 853006 (4 December 2012); https://doi.org/10.1117/12.977307

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