29 November 2012 An exhaustive study of laser damage in ion beam sputtered pure and mixture oxide thin films at 1030 nm with 500 fs pulse durations
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Abstract
We report on the laser damage resistance of thin films prepared by Ion Beam Sputtering. The samples are fused silica substrates coated with single layer films of pure oxides (SiO2, Nb2O5, ZrO2, HfO2, Ta2O5, Al2O3, Sc2O3) and oxide mixtures with various ratios (Nb2O5/SiO2, ZrO2/SiO2, HfO2/SiO2, Ta2O5/SiO2, Al2O3/SiO2 and Sc2O3/SiO2). For this study the LIDT of more than 60 different samples have measured at 1030nm with pulse durations of 500fs with single pulse irradiation. The results are expressed and compared in terms of LIDT as a function of the measured band gap energy and refractive index. For simple oxide materials a linear evolution of the LIDT with bandgap is observed, with the exception of Sc2O3 material where a very high damage threshold is observed, compared to other high index materials. In the case of mixtures, a more complex behavior is evidenced.
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Laurent Gallais, Laurent Gallais, Benoit Mangote, Benoit Mangote, Mireille Commandré, Mireille Commandré, Mathias Mende, Mathias Mende, Lars Jensen, Lars Jensen, Henrik Ehlers, Henrik Ehlers, Marco Jupé, Marco Jupé, Detlev Ristau, Detlev Ristau, Andrius Melninkaitis, Andrius Melninkaitis, Valdas Sirutkaitis, Valdas Sirutkaitis, Simonas Kičas, Simonas Kičas, Tomas Tolenis, Tomas Tolenis, Ramutis Drazdys, Ramutis Drazdys, "An exhaustive study of laser damage in ion beam sputtered pure and mixture oxide thin films at 1030 nm with 500 fs pulse durations", Proc. SPIE 8530, Laser-Induced Damage in Optical Materials: 2012, 85300K (29 November 2012); doi: 10.1117/12.977553; https://doi.org/10.1117/12.977553
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