4 December 2012 Ion beam sputtered Y2O3
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Proceedings Volume 8530, Laser-Induced Damage in Optical Materials: 2012; 85300Z (2012); doi: 10.1117/12.976808
Event: SPIE Laser Damage, 2012, Boulder, Colorado, United States
Abstract
We have investigated the ion beam sputtering (IBS) of Y2O3 as an alternative to HfO2 for high index layers in interference coatings for high power lasers. We present results on structural and optical properties of Y2O3 deposited from an oxide target. The IBS Y2O3 films are amorphous with a surface roughness of <6 Å for λ/4 thickness at 1 μm. The Y2O3 films are transparent with extremely low absorption loss at 1 μm and laser damage is in the range 10 J/cm2 when tested at a wavelength of 1.03 μm and pulse duration of 375 ps.
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D. Patel, P. F. Langston, L. M. Imbler, L. A. Emmert, A. S. Markosyan, R. Route, M. M Fejer, W. Rudolph, C. S. Menoni, "Ion beam sputtered Y2O3", Proc. SPIE 8530, Laser-Induced Damage in Optical Materials: 2012, 85300Z (4 December 2012); doi: 10.1117/12.976808; https://doi.org/10.1117/12.976808
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KEYWORDS
Ion beams

Absorption

Laser induced damage

Sputter deposition

Argon

Oxygen

Silica

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