15 October 2012 Hydrogenated amorphous carbon films having embedded nanoparticles deposited by cathodic jet carbon arc technique
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Proceedings Volume 8549, 16th International Workshop on Physics of Semiconductor Devices; 85491M (2012); doi: 10.1117/12.924629
Event: 16th International Workshop on Physics of Semiconductor Devices, 2011, Kanpur, India
Abstract
This paper reports the formation and properties of hydrogenated amorphous carbon (a-C: H) films having embedded nanoparticles deposited by cathodic jet carbon arc (CJCA) technique in absence of magnetic field. The films have been characterized by XRD, HRTEM, XPS, dark conductivity, activation energy, optical band gap, residual stress, hardness, elastic modulus and plastic index parameter. The properties evaluated of a-C: H films having embedded particles have been compared with that of undoped and nitrogen doped a-C films having embedded nanoparticles deposited by CJCA technique. All the properties of a- C films studied are found to depend on the gaseous environment used during the deposition of the films. These a-C films having embedded nanoparticles act as hard coating materials.
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O. S. Panwar, . Ishpal, R. K. tripathi, A. K. Srivastava, Sushil Kumar, "Hydrogenated amorphous carbon films having embedded nanoparticles deposited by cathodic jet carbon arc technique", Proc. SPIE 8549, 16th International Workshop on Physics of Semiconductor Devices, 85491M (15 October 2012); doi: 10.1117/12.924629; http://dx.doi.org/10.1117/12.924629
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KEYWORDS
Carbon

Nanoparticles

Hydrogen

Nitrogen

Magnetism

Coating

Crystals

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