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15 October 2012 Fabrication of two dimensional carbon nanostructures using hot wire chemical vapor deposition technique
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Proceedings Volume 8549, 16th International Workshop on Physics of Semiconductor Devices; 854926 (2012) https://doi.org/10.1117/12.927273
Event: 16th International Workshop on Physics of Semiconductor Devices, 2011, Kanpur, India
Abstract
Two dimensional carbon nanostructures (carbon nanosheets) are fabricated using Hot Wire Chemical Vapor Deposition (HWCVD) technique assisted by H radical injection, using CH4 as source gas. Carbon nanosheets are grown on crystalline Si(100) wafer as well as on corning glass substrate without using catalyst. The grown carbon nanosheets are aligned vertically on the substrate with thickness in the range of 10-20 nm and about 60-80 nm in height.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mukesh Singh, Himanshu S. Jha, Asha Yadav, . Lalhriatzuala, Dinesh Deva, and Pratima Agarwal "Fabrication of two dimensional carbon nanostructures using hot wire chemical vapor deposition technique", Proc. SPIE 8549, 16th International Workshop on Physics of Semiconductor Devices, 854926 (15 October 2012); https://doi.org/10.1117/12.927273
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