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Anindita Das, Sanatan Chattopadhyay, Goutam Kumar Dalapati, Dongzhi Chi, M. K. Kumar, "Optical and electrical characterization of atomic layer deposited (ALD) HfO2/p-GaAs MOS capacitors," Proc. SPIE 8549, 16th International Workshop on Physics of Semiconductor Devices, 85493I (15 October 2012);